Self-Aligned Electrodes on SU-8 Negative Photoresist Pedestals
نویسندگان
چکیده
منابع مشابه
Use of SU-8 Negative Photoresist for Optical Mask Manufacturing
The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive ebeam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching . However, difficult CD ...
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ژورنال
عنوان ژورنال: Journal of Microelectromechanical Systems
سال: 2014
ISSN: 1057-7157,1941-0158
DOI: 10.1109/jmems.2014.2313723